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Kookje Electric Korea Co., Ltd.
with putting all efforts on continuous research and development
based on the company philosophy of being 'the
Foundation of Korean Semiconductor Industry' was
jointly established with worldwide semiconductor equipment maker
Hitachi Kokusai Electric Inc. in May, 1993. Our goal is localizing
the semiconductor equipment through the manufacture, sales of
semiconductor & LCD equipment, maintenance and R&D.
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[Entire View
of Company ]
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| Our major products are the Vertical Diffusion Furnace proceeding
isolation process and others by generating oxide films, and
Vertical LP CVD System treats that generate crucial films of
equipment. These equipment take charge of critical processes
in high quality semiconductor productions. |
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[Video Conference
System]
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[CAD System]
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In addition, we have succeeded in complete localization of
the Gas Unit, a critical part of the equipment, and in Oct.
2000, we have successfully accomplished the joint development
of No.1 localized LP OXIDATION System for mass production (Ultra
Thin Silicon Oxide Film Growing System), a low-pressure oxide-generating
system with applied ultra thin film technology, with the attached
Institute of Samsung Electronics.
Kookje Electric Korea Co., Ltd. isn't satisfied with our present
achievements and we will continue to focus on the research and
development. We are putting all our efforts on development of
the next generation Atomic Layer Deposition System, that will
substitute existing Chemical Vapor Deposition System, Single
Wafer Oxidation System applicable with 300mm and batch system.
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