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Single Plasma Nitration·Oxidation Equipment(MARORA)
MARORA - Single Wafer Plasma Nitridation / Oxidation System

MARORA provides best solutions for gate dielectric film formation for next generation advanced logic and memory devices. This tool uses a unique "modified magnetron typed (MMT)" plasma source. MMT technology provides high density plasma and low electron temperature (<1eV) which makes very uniform nitridation process possible without damaging substrates.

※ MARORA is a registered trademark of KOKUSAI ELECTRIC CORPORATION
Process Applications
Plasma Nitridation
- Oxide nitridation
Plasma Oxidation
- Gate dielectric
- Selective oxidation
- Anisotropic oxidation
Features
High Throughput: Doubled productivity compared with conventional solutions
MMT Plasma Source: Excellent uniform and very low temperature electron plasma at wafer surface (~1eV
Wide Range Process Temperature: Newly developed high temperature heater
Expanded Process Applications: Selective oxidation (oxidize silicon but no oxidation on metallic material)